- plasma sputtering
- Смотри плазменное распыление.
Энциклопедический словарь по металлургии. — М.: Интермет Инжиниринг. Главный редактор Н.П. Лякишев. 2000.
plasma sputtering
Смотреть что такое "plasma sputtering" в других словарях:
plasma sputtering — plazminis dulkinimas statusas T sritis radioelektronika atitikmenys: angl. plasma sputtering vok. Plasmazerstäubung, f rus. плазменное распыление, n pranc. pulvérisation à plasma, f … Radioelektronikos terminų žodynas
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Plasma-unterstütztes Ätzen — (physikalisch chemisches Ätzen) bezeichnet eine Gruppe von subtraktiven (abtragenden) Mikrostrukturverfahren in der Halbleitertechnologie. Als Trockenätzverfahren stellen sie alternative Strukturierungsverfahren zum sog. Nassätzen (nasschemischen … Deutsch Wikipedia
Sputtering — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Plasma (physics) — For other uses, see Plasma. Plasma lamp, illustrating some of the more complex phenomena of a plasma, including filamentation. The colors are a result of relaxation of electrons in excited states to lower energy states after they have recombined… … Wikipedia
pulvérisation à plasma — plazminis dulkinimas statusas T sritis radioelektronika atitikmenys: angl. plasma sputtering vok. Plasmazerstäubung, f rus. плазменное распыление, n pranc. pulvérisation à plasma, f … Radioelektronikos terminų žodynas
Pulvérisation cathodique (sputtering) — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Interacción plasma-pared — Este artículo o sección sobre física necesita ser wikificado con un formato acorde a las convenciones de estilo. Por favor, edítalo para que las cumpla. Mientras tanto, no elimines este aviso puesto el 15 de diciembre de 2007. También puedes… … Wikipedia Español
High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… … Wikipedia
